Laser triggered Z-pinch broadband extreme ultraviolet source for metrology
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منابع مشابه
Extreme ultraviolet light sources–State of the art, future developments, and potential applications
Semiconductor micro-chips with critical dimensions of 50 nm and below will likely be manufactured with extreme ultraviolet (EUV) lithography at a wavelength of 13.5 nm. Among others EUV lithography requires a brilliant radiation source with output power between 50W and 120W collected in an intermediate focus at the entrance of the exposure tool. The development of these powerful EUV sources wil...
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تاریخ انتشار 2013